NTT-AT has been supplying high-quality XUV, EUV, and X-ray mirrors for more than 20 years, it provides custom-designable multi-layer film mirrors adapted to meet individual customer requirements.
Since the 1990s, NTT-AT has developed and sold extreme ultraviolet (XUV or EUV) multi-layer mirrors and X-ray mirrors. The design of these mirrors reflects the feedback received from university, research institute, and enterprise customers in Asia, North America, South America, and Europe. Its vast reservoir of accumulated know-how and reliable technologies are what support the production of your multi-layer mirror.
Multi-layer materials and structure are customized to meet your detailed specifications, such as substrate, peak wavelength, bandwidth, and dispersion. High heat-durability multi-layer mirrors are also supported. A reflectivity evaluation service using synchrotron facilities is also available as an option.
|XUV (EUV) mirror||EUV lithography
High-order harmonics applications
|50 eV ~100 eV
50 eV~100 eV
50 eV ~ 70 eV
25 eV ~50 eV
|Single layer mirror||SiC
|10 eV ~ 100 eV|
|X-ray mirror||Synchrotron applications
Built into X-ray non-destructive
|1 keV ~ 30 keV|
|Single layer mirror||C
|1 keV ~ 30 ke|