Description
NTT-AT has been supplying high-quality XUV, EUV, and X-ray mirrors for more than 20 years, it provides custom-designable multi-layer film mirrors adapted to meet individual customer requirements.
Since the 1990s, NTT-AT has developed and sold extreme ultraviolet (XUV or EUV) multi-layer mirrors and X-ray mirrors. The design of these mirrors reflects the feedback received from university, research institute, and enterprise customers in Asia, North America, South America, and Europe. Its vast reservoir of accumulated know-how and reliable technologies are what support the production of your multi-layer mirror.
Features
Multi-layer materials and structure are customized to meet your detailed specifications, such as substrate, peak wavelength, bandwidth, and dispersion. High heat-durability multi-layer mirrors are also supported. A reflectivity evaluation service using synchrotron facilities is also available as an option.
Parameter
| Application example | Substrate materials |
Typical wavelength |
||
| XUV (EUV) mirror | EUV lithography High-order harmonics applications Attosecond science X-ray laser |
Multi-layer mirror | Mp/Si Ru/Si Zr/Al SiC/Mg Cr/C |
50 eV ~100 eV 50 eV~100 eV 50 eV ~ 70 eV 25 eV ~50 eV ~300 eV |
| Single layer mirror | SiC Pt Ru |
10 eV ~ 100 eV | ||
| X-ray mirror | Synchrotron applications XFEL applications Built into X-ray non-destructive inspection devices |
Multi-layer mirror | W/C W/B4C Ru/C Pt/C |
1 keV ~ 30 keV |
| Single layer mirror | C B4C SiC Cr Ni |
1 keV ~ 30 ke |
