EUV Mirrors/X-ray Mirrors

EUV Mirrors/X-ray Mirrors

Description

NTT-AT has been supplying high-quality XUV, EUV, and X-ray mirrors for more than 20 years, it provides custom-designable multi-layer film mirrors adapted to meet individual customer requirements.

Since the 1990s, NTT-AT has developed and sold extreme ultraviolet (XUV or EUV) multi-layer mirrors and X-ray mirrors. The design of these mirrors reflects the feedback received from university, research institute, and enterprise customers in Asia, North America, South America, and Europe. Its vast reservoir of accumulated know-how and reliable technologies are what support the production of your multi-layer mirror.

Features

Multi-layer materials and structure are customized to meet your detailed specifications, such as substrate, peak wavelength, bandwidth, and dispersion. High heat-durability multi-layer mirrors are also supported. A reflectivity evaluation service using synchrotron facilities is also available as an option.

Parameter

Application example Substrate
materials
Typical
wavelength
XUV (EUV) mirror EUV lithography
High-order harmonics applications
Attosecond science
X-ray laser
Multi-layer mirror Mp/Si
Ru/Si
Zr/Al
SiC/Mg
Cr/C
50 eV ~100 eV
50 eV~100 eV
50 eV ~ 70 eV
25 eV ~50 eV
~300 eV
Single layer mirror SiC
Pt
Ru
10 eV ~ 100 eV
X-ray mirror Synchrotron applications
XFEL applications
Built into X-ray non-destructive
inspection devices
Multi-layer mirror W/C
W/B4C
Ru/C
Pt/C
1 keV ~ 30 keV
Single layer mirror C
B4C
SiC
Cr
Ni
1 keV ~ 30 ke
All Information given here is reliable to our best knowledge. No responsibility is assumed for possible inaccuracies or omissions. Specifications and external appearances are subject to change without notice.